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Semiconductor devices. Non-destructive recognition criteria of defects in silicon carbide homoepitaxial wafer for power devices - Classification of defects

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Semiconductor devices. Non-destructive recognition criteria of defects in silicon carbide homoepitaxial wafer for power devices - Classification of defectsWhat is this standard about? This part of IEC 63068 gives a classification of defects in as grown 4H SiC (Silicon Carbide) epitaxial layers. The defects are classified on the basis of their crystallographic structures and recognized by non destructive detection methods including bright field OM (optical microscopy), PL (photoluminescence), and XRT (X ray topography) images.

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