Surface chemical analysis. Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy1 Scope This International Standard specifies a TXRF method for the measurement of the atomic surface density of elemental contamination on chemomechanically polished or epitaxial silicon wafer surfaces. The method is applicable to the following: elements of atomic number from 16 (S) to 92 (U); contamination elements with atomic surface densities from 1 1010 atoms cm2 to 1 1014 atoms cm2; contamination elements with atomic surface densities from 5 108

2 and used by an evaluation process to analyse data independently from other computer system's components

What is this BS EN 60843-4 - Method of auxiliary data recording with helical-scan digital video cassette recording system about

The design information contained in BS 5268-6

This European Standard specifies a field test method for evaluating the effectiveness of wood preservatives in a ground contact situation

1   The scope of these recommendations is confined to buffer-type protection principally relating to British Standard trolleys

design of steel structures for accidental exposure to fire

This part of ISO 21927 provides the test methods for

Supplementary footnote c) in Table 4 concerning scanning coverage with angle-beam probes for products of type 3c)

BS EN 80000-14 provides names

Airframe control bearings are characterized as lightweight

BS EN 12259-1 on sprinklers is useful for:

Who is BS 2559 for